Massachusetts Materials Research Installs New Perkin Elmer Optima 5300DV ICP-OES Plasma Spectrometer
20 January 2009
WEST BOYLSTON, MA - January 21, 2009 - Massachusetts Materials Research, Inc (MMR) has installed a new plasma spectrometer at their 22,000 square foot laboratory facility in West Boylston, Massachusetts. The New Perkin Elmer 5300 measures all wavelengths of interest at one time while also allowing background correction measurements, both at the same time. And according to MMR’s Chief Chemist Jianjian Cai, “these two things alone have improved our measurement accuracy and analysis speed greatly”.
Main features at a glance
- Enhanced sample throughput and performance with simultaneous background correction
- Exclusive high-resolution mode provides easier method development and greater accuracy
- Thermally stabilized optical system eliminates peak profiling and searching, ensuring exceptional long-term stability
- Dual-view optical system uses Axial and Radial viewing ensuring the widest working range and increases sensitivity
- State-of-the-art, simple-to-use software, with the stability and security of the latest Microsoft Windows operating system
- Advanced features, including simultaneous background correction and multi-component spectral fitting (MSF) for superior interference correction
- User-defined QC protocols for regulatory compliance
By combing the features of automatic dual viewing of the plasma source with enhanced control software, the instrument provides very low detection limits, wide concentration ranges, efficient operation, and all around solid performance.
