Zygo’s optical systems division has received a $9m contract to develop extreme ultraviolet lithography optics for the fifth-generation micro-exposure tool (MET-5).
The MET-5 programme will help researchers to extend semiconductor lithography resolution capability to less than 16nm, which would support of extreme ultraviolet resist and mask developments.
The company’s Extreme Precision Optics operation in California, US, will conduct an advanced development and production programme, which is expected to last for 22 months.
Zygo president and CEO Chris Koliopoulos said that the development of the MET-5 will further solidify Zygo’s position as a key supplier of extreme ultraviolet components.
The contract was awarded by the College of Nanoscale Science and Engineering at the University at Albany and the SEMATECH consortium of chip makers.