Topcon‘s patent involves an optical interference measuring apparatus that uses electromagnetic waves to acquire interferograms for depth profiling. The apparatus estimates parameters for different surface counts, selects an optimal model formula, and reconfigures intensity profiles based on the model. This innovation enhances accuracy in surface structure analysis. GlobalData’s report on Topcon gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Topcon, Eye-tracking wearables was a key innovation area identified from patents. Topcon's grant share as of May 2024 was 50%. Grant share is based on the ratio of number of grants to total number of patents.
Optical interference measuring apparatus for depth profile reconstruction
A recently granted patent (Publication Number: US12000699B2) discloses an optical interference measuring apparatus and method. The apparatus includes a measuring unit with a light source, beam splitter, reference surface, and detector to acquire an interferogram. An electrical circuit performs Fourier transform to configure an intensity profile in a depth direction. It estimates parameters based on a model formula for a layered structure with reflecting surfaces, reconfigures the interferogram, calculates likelihood, and selects an optimal model formula to reconfigure the intensity profile.
Furthermore, the optical interference measuring apparatus can estimate parameters based on a model formula for a layered structure with constant refractive index, determine the assumed surface count range based on the structure characteristic of the measurement target or the peak count of the intensity profile. The method involves configuring an intensity profile by irradiating the measurement target and reference surface with electromagnetic waves, estimating parameters for each assumed surface count, selecting an optimal model formula statistically, and reconfiguring the intensity profile based on the optimal model formula. The selection process involves reconfiguring the interferogram, calculating likelihood, and selecting the optimal model formula based on an information amount criterion. This innovative technology offers a precise and efficient way to measure optical interference, particularly in layered structures, enhancing accuracy and reliability in various applications.
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