Hoya has been granted a patent for a reflective mask blank designed to enhance EUV exposure performance. The innovative structure features a multilayer reflective film and an absorber film with varying concentrations of hydrogen or deuterium, aimed at reducing peeling and thickness issues during manufacturing. GlobalData’s report on Hoya gives a 360-degree view of the company including its patenting strategy. Buy the report here.
Smarter leaders trust GlobalData
According to GlobalData’s company profile on Hoya, AI-assisted medical imaging was a key innovation area identified from patents. Hoya's grant share as of July 2024 was 55%. Grant share is based on the ratio of number of grants to total number of patents.
Reflective mask blank for euv lithography with tailored absorber film
The patent US12072619B2 describes a reflective mask blank designed for use in semiconductor manufacturing. This mask blank consists of a substrate, a multilayer reflective film, and an absorber film that includes an absorption layer and a reflectance adjustment layer. The absorption layer is composed of tantalum (Ta), nitrogen (N), and an additive element, which can be either hydrogen (H) or deuterium (D). Notably, the concentration of the additive element varies between the lower surface region, which faces the substrate, and the upper surface region, which is opposite the substrate. The claims specify that the total concentration of the additive element can be higher in either region, with a defined range of 0.1 atomic % to 30 atomic % for the absorption layer.
Additionally, the patent outlines methods for manufacturing both the reflective mask and semiconductor devices using the reflective mask. The manufacturing process involves setting the reflective mask in an exposure apparatus that emits extreme ultraviolet (EUV) light, allowing for the transfer of a pattern onto a resist film on a target substrate. The claims also detail the inclusion of a protective film made of ruthenium (Ru) between the multilayer reflective film and the absorber film, which may also contain the additive elements. This innovative design aims to enhance the performance and efficiency of reflective masks in semiconductor fabrication, addressing the need for precise patterning in advanced manufacturing processes.
To know more about GlobalData’s detailed insights on Hoya, buy the report here.
Data Insights
From
The gold standard of business intelligence.
Blending expert knowledge with cutting-edge technology, GlobalData’s unrivalled proprietary data will enable you to decode what’s happening in your market. You can make better informed decisions and gain a future-proof advantage over your competitors.
GlobalData, the leading provider of industry intelligence, provided the underlying data, research, and analysis used to produce this article.
GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
